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Self-organized growth of nanostructure arrays on strain-relief patterns

✍ Scribed by Kern, Klaus; Brune, Harald; Giovannini, Marcella; Bromann, Karsten


Book ID
109720170
Publisher
Nature Publishing Group
Year
1998
Tongue
English
Weight
477 KB
Volume
394
Category
Article
ISSN
0028-0836

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In order to directly control the size and in particular the position ofnanostructures naturally formed on high-index semiconductor surfaces during molecular beam epitaxy (MBE) and metalorganic vapor phase epitaxy (MOVPE), the growth on patterned high-index GaAs substrates is investigated. During MBE