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Self-Organized Complex Patterning: Langmuir–Blodgett Lithography

✍ Scribed by S. Lenhert; L. Zhang; J. Mueller; H. P. Wiesmann; G. Erker; H. Fuchs; L. Chi

Book ID
101411954
Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
401 KB
Volume
16
Category
Article
ISSN
0935-9648

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✦ Synopsis

Self‐patterning monolayer films prepared by the Langmuir–Blodgett technique have been used as resists for anisotropic chemical etching of Si 〈100〉. The resulting topographies are transferred onto polymer surfaces to guide the growth of biological cells. This method allows rapid and simple nanolithography of complex nanopatterns over large areas.

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