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Self-assembled monolayer-modified block copolymers for chemical surface nanopatterning

✍ Scribed by N.A. Yufa; S.L. Fronk; S.J. Rosenthal; Seth B. Darling; W.A. Lopes; S.J. Sibener


Book ID
113783979
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
799 KB
Volume
125
Category
Article
ISSN
0254-0584

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Recent studies show that the self-assembled monolayer (SAM) is well suited to control the selectivity of chemical vapor deposition (CVD). Here, we reported the selective CVD for copper on the functionalized SAM surfaces (with -SH, -SS-, and -SO 3 H terminal groups). The -SS-and -SO 3 H terminal grou