Self-aligned CoSi2 and TiW(N) local interconnect in a submicron CMOS process

✍ Scribed by R.D.J. Verhaar; A.A. Bos; J.M.F.G. Van Laarhoven; H. Kraaij; R.A.M. Wolters

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 749 KB
• Volume: 38
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(89)90567-9