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Selective wet etching of Si3N4/SiO2 in phosphoric acid with the addition of fluoride and silicic compounds

✍ Scribed by Seo, Dongwan; Bae, Jin Sung; Oh, Eunseok; Kim, Solbaro; Lim, Sangwoo

Book ID: 123524573
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 497 KB
Volume: 118
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2013.12.027

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