Selective TiSi2deposition with no silicon substrate consumption by rapid thermal processing in a LPCVD reactor

✍ Scribed by J. Mercier; J. L. Regolini; D. Bensahel

• Book ID: 112839324
• Publisher: Springer US
• Year: 1990
• Tongue: English
• Weight: 650 KB
• Volume: 19
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/bf02733815