✦ LIBER ✦
Selective layers of TiSi2 deposited without substrate consumption in a cold wall LPCVD reactor
✍ Scribed by J.L. Regolini; D. Bensahel; G. Bomchil; J. Mercier
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 457 KB
- Volume
- 38
- Category
- Article
- ISSN
- 0169-4332
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