Selective Deposition of Copper with Iodine Assisted Growth of MOCVD on an MPTMS Monolayer Surface at a Low Temperature

✍ Scribed by Mohammad Arifur Rahman; Heejung Park; Ara Kim; Chiyoung Lee; Jaegab Lee

• Book ID: 111857088
• Publisher: The Korean Institute of Metals and Materials
• Year: 2010
• Tongue: English
• Weight: 396 KB
• Volume: 6
• Category: Article
• ISSN: 1738-8090
• DOI: 10.3365/eml.2010.12.209