Scanning electron-beam annealing of arsenic- and bismuth-implanted silicon: A Bontemps et al, J Appl Phys, 53 (7), 1982, 5258–5264

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 147 KB
• Volume: 35
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(85)90522-6