Scaling the microwave plasma-assisted chemical vapor diamond deposition process to 150–200 mm substrates

✍ Scribed by King, D.; Yaran, M.K.; Schuelke, T.; Grotjohn, T.A.; Reinhard, D.K.; Asmussen, J.

• Book ID: 122633682
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 591 KB
• Volume: 17
• Category: Article
• ISSN: 0925-9635
• DOI: 10.1016/j.diamond.2007.12.050