Run-to-run control in semiconductor manufacturing

✍ Scribed by James Moyne; Enrique Del Castillo; Arnon Max Hurwitz

• Publisher: CRC Press
• Year: 2001
• Tongue: English
• Leaves: 342
• Category: Library

✦ Synopsis

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control

✦ Table of Contents

Content: Introduction What is Run-top-Run Control? Target Audience Purpose of this Book Outline Background Current State-of-the-Art in Semiconductor Manufacturing Process Control History of the Development of Run-to-Run Control Current State o-of-the-Art in Run-to-Run Control Development and Deployment Simple Example: Run-to-Run Control and Comparison to Statistical Process Control Identifying Target Applications for Run-to-Run Control Class of Applications that can Utilize Run-t0-Run Control General Run-to-Run Control Development and Deployment Process Issues in Deploying Run-to-Run Control Developing a Run-to-Run Solution: Run-to-Run Algorithms Introduction Linear Approximation Algorithms Higher Order Approximation Algorithms Neural Network Algorithms Other Approaches Developing a Run-to-Run Solution: Practical Extensions to Algorithms Developing and Deploying Run-to-Run Solutions: Integrating Control Introduction The Generic Cell Controller Other Approaches Integrating into Factory-Wide Manufacturing System Run-to-Run Solution Development, Deployment, and Customization Methodology Introduction Process Identification Choosing a Run-to-Run Control Solution Customizing the Run-to-Run Control Solution to the Process Issues Run-to-Run Control System Deployment Case Studies Chemical-Mechanical Planarization Vapor Phase Epitaxy Advanced Topics Feasibility Analysis of Run-to-Run Control Solutions Stability Analysis of Run-to-Run Control Solutions Combining Process Run-to-Run Control with Inter-Process Control Conclusions Summary of Run-to-Run Development and Deployment Process Deploying Run-to-Run Control in a Timely and Cost Effective Manner Overcoming Barriers to Deployment Future Research and Development Issues References