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๐Ÿ“

Run-to-Run Control in Semiconductor Manufacturing

โœ Scribed by James Moyne, Enrique del Castillo, Arnon M. Hurwitz


Publisher
CRC Press
Year
2000
Tongue
English
Leaves
341
Edition
1
Category
Library

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โœฆ Synopsis


Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.


๐Ÿ“œ SIMILAR VOLUMES


Run-to-run control in semiconductor manu
โœ James Moyne; Enrique Del Castillo; Arnon Max Hurwitz ๐Ÿ“‚ Library ๐Ÿ“… 2001 ๐Ÿ› CRC Press ๐ŸŒ English

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lith

Run-to-run control in semiconductor manu
โœ James Moyne, Enrique del Castillo, Arnon M. Hurwitz ๐Ÿ“‚ Library ๐Ÿ“… 2001 ๐Ÿ› CRC Press ๐ŸŒ English

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lith