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[RTP 9th International Conference on Advanced Thermal Processing of Semiconductors. RTP 2001 - Anchorage, AK, USA (25-29 Sept. 2001)] 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001 - Excimer-laser activation of dopants in silicon : a high-energy excimer laser source for a single shot and uniform treatment over a whole die area

✍ Scribed by Prat, C.; Zahorski, D.; Stehle, M.; Boulmer, J.; Debarre, D.; Kerrien, G.

Book ID: 126743399
Publisher: RTP
Year: 2001
Weight: 138 KB
Category: Article
DOI: 10.1109/RTP.2001.1013759

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