๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Room temperature defect diffusion in ion implanted c-Si

โœ Scribed by Sebania Libertino; Salvatore Coffa; Antonino La Magna


Book ID
114165141
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
144 KB
Volume
186
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Defect diffusion in ion implanted glasse
โœ G.W. Arnold; G. Battaglin; A. Boscolo-Boscoletto; F. Caccavale; G. De Marchi; P. ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 425 KB
Boron lattice location in room temperatu
โœ A.M. Piro; L. Romano; S. Mirabella; M.G. Grimaldi ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 130 KB

The B lattice location in presence of a Si-self-interstitial (I Si ) supersaturation, controlled by energetic proton bombardment, has been studied by means of ion channelling and massive Monte Carlo simulations. B-doped layers of Si crystals with a B concentration of 1 ร— 10 20 B/cm 3 were grown by M

Hydrogen-induced defects in ion-implante
โœ Socher, S.; Lavrov, E. V.; Weber, J. ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› The American Physical Society ๐ŸŒ English โš– 559 KB