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Defect engineering via ion implantation to control B diffusion in Si

✍ Scribed by M. Canino; G. Regula; M. Xu; E. Ntzoenzok; B. Pichaud

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 625 KB
Volume: 159-160
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2008.10.033

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