๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Role of numerical simulations in the semiconductor heterostructure technology using molecular beam epitaxy

โœ Scribed by Jasprit Singh; K.K. Bajaj


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
757 KB
Volume
2
Category
Article
ISSN
0749-6036

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Role of molecular beam epitaxy in the op
โœ H.P. Meier ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 493 KB

Having celebrated its twenty-second anniversary, molecular beam epitaxy (MBE) has reached a very mature state as a crystallographic growth technique for a variety of semiconductor materials. It is widely used at universities, for industrial research in development laboratories and in production. Com