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rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

✍ Scribed by Hoey, Megan L.; Carlson, J. B.; Osgood, R. M.; Kimball, B.; Buchwald, W.


Book ID
121803230
Publisher
American Institute of Physics
Year
2010
Tongue
English
Weight
495 KB
Volume
97
Category
Article
ISSN
0003-6951

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