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Resistivity changes and phase evolution in W-N films deposited in NeN2 and ArN2 discharges: Karl John Huber and Carolyn Rubin Aita, J Vac Sci Technol, A6, 1988, 1717–1721

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 150 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90346-1

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Growth of Al and Al nitride films in N2−

Growth of Al and Al nitride films in N2−Ne and N2−(Ne+Ar) discharges: construction of a ternary gas phase diagram: James R Siettmann and Carolyn Rubin Aita,J Vac Sci Technol,A6, 1988, 1712–1716

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 150 KB