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Residual stress, microstructure, and structure of tungsten thin films deposited by magnetron sputtering

✍ Scribed by Shen, Y. G.; Mai, Y. W.; Zhang, Q. C.; McKenzie, D. R.; McFall, W. D.; McBride, W. E.

Book ID
118248598
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
477 KB
Volume
87
Category
Article
ISSN
0021-8979

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Mo(Cr) thin films were deposited by an Ionized Physical Vapor Deposition process i.e. Ionized Magnetron Sputtering (IMS). This deposition technique enables to ionize the neutral metallic sputtered species by a secondary plasma generated through a radio-frequency (RF: 13.56 MHz) powered coil. Thus, b