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Residual stress in silicon dioxide thin films produced by ion-assisted deposition

โœ Scribed by J.Y. Robic; H. Leplan; Y. Pauleau; B. Rafin


Book ID
114086130
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
372 KB
Volume
290-291
Category
Article
ISSN
0040-6090

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