Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution

✍ Scribed by Y.Q. Fu; J.K. Luo; S.B. Milne; A.J. Flewitt; W.I. Milne

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 415 KB
• Volume: 124-125
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2005.08.104