Removal of NF3 from semiconductor-process flue gases by tandem packed-bed plasma and adsorbent hybrid systems

✍ Scribed by Jen-Shih Chang; Kostov, K.G.; Urashima, K.; Yamamoto, T.; Okayasu, Y.; Kato, T.; Iwaizumi, T.; Yoshimura, K.

• Book ID: 117864883
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 265 KB
• Volume: 36
• Category: Article
• ISSN: 0093-9994
• DOI: 10.1109/28.871272