Removal of C2F6 from a semiconductor process flue gas by a ferroelectric packed-bed barrier discharge reactor with an adsorber

✍ Scribed by Urashima, K.; Kostov, K.G.; Jen-Shih Chang; Okayasa, Y.; Iwaizumi, T.; Yoshimura, K.; Kato, T.

• Book ID: 117865129
• Publisher: IEEE
• Year: 2001
• Tongue: English
• Weight: 240 KB
• Volume: 37
• Category: Article
• ISSN: 0093-9994
• DOI: 10.1109/28.952521