Reliability and Thermal Stability of Clustered Vertical Furnace-Grown SiO2 With HfxTayN Metal Gate for Advanced MOS Device Application

✍ Scribed by Kuei-Shu Chang-Liao; Chin-Lung Cheng; Chun-Yuan Lu; Bhabani Shankar Sahu; Tzu-Chen Wang; Tien-Ko Wang; Shang-Feng Huang; Wen-Fa Tsai; Chi-Fong Ai

• Book ID: 114618594
• Publisher: IEEE
• Year: 2007
• Tongue: English
• Weight: 334 KB
• Volume: 54
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2006.888755