Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests

✍ Scribed by Naulleau, Patrick P.

• Book ID: 115351570
• Publisher: The Optical Society
• Year: 2004
• Tongue: English
• Weight: 689 KB
• Volume: 43
• Category: Article
• ISSN: 1559-128X
• DOI: 10.1364/AO.43.004025