Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography

✍ Scribed by Naulleau, Patrick P.

• Book ID: 115354449
• Publisher: The Optical Society
• Year: 2009
• Tongue: English
• Weight: 904 KB
• Volume: 48
• Category: Article
• ISSN: 1559-128X
• DOI: 10.1364/AO.48.003302