Silicon dioxide-like barrier films were deposited by plasma enhanced chemical vapor deposition from different siloxane and silane precursors. The variation of the precursor was investigated as a route to obtain silicon dioxide-like films with different structures, densities and hence barrier perform
โฆ LIBER โฆ
Relationship between the orientation of texture and heteroepitaxy of diamond and related materials films on silicon single crystal and the valence electron structure of the interface
โ Scribed by Li ZhiLin; ZhiFeng Li; Qin Huang
- Book ID
- 107354983
- Publisher
- SP Science China Press
- Year
- 2007
- Tongue
- English
- Weight
- 625 KB
- Volume
- 50
- Category
- Article
- ISSN
- 1006-9321
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