Atomic Layer Deposition-Modified Ordered
β
David E. Cassidy; William J. DeSisto
π
Article
π
2012
π
John Wiley and Sons
π
English
β 304 KB
Mesoporous silica membranes, prepared by surfactant-templating with a pore diameter of $4 nm on an alumina support, are modified by atomic layer deposition (ALD) of aluminum oxide. ALD of aluminum oxide is achieved using trimethyl aluminum (TMA) and water as reactants. Membranes modified up to 50 AL