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Atomic Layer Deposition-Modified Ordered Mesoporous Silica Membranes

✍ Scribed by David E. Cassidy; William J. DeSisto

Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
304 KB
Volume
18
Category
Article
ISSN
0948-1907

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✦ Synopsis

Mesoporous silica membranes, prepared by surfactant-templating with a pore diameter of $4 nm on an alumina support, are modified by atomic layer deposition (ALD) of aluminum oxide. ALD of aluminum oxide is achieved using trimethyl aluminum (TMA) and water as reactants. Membranes modified up to 50 ALD reaction cycles are characterized periodically during progressive reaction cycles to provide details of the pore modification process. A decrease in light gas permeance, pore size distribution shift to lower pore sizes, and a decrease in porosity provide evidence for pore-size reduction through ALD. Further analysis of the data indicates that the ALD reaction favors larger pores and defects, and becomes less efficient as the pore size decreases.

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## Abstract **Summary:** Mesoporous silica was used as substrate for the grafting of alkyl halides initiators. The control over the surface‐initiated polymerization of styrene and MMA, in terms of molar mass and molar mass distribution, was successfully achieved using an ATRP mechanism. The occurre