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Reduction of the tensile stress in CoSi2 films by pre-deposition carbon ion implantation

✍ Scribed by J.F. Liu; J.Y. Feng; W.Z. Li

Book ID: 114165902
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 207 KB
Volume: 194
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(02)00780-2

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