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Reduced defect density in silicon-on-insulator structures formed by oxygen implantation in two steps

✍ Scribed by Margail, J.; Stoemenos, J.; Jaussaud, C.; Bruel, M.

Book ID: 120210930
Publisher: American Institute of Physics
Year: 1989
Tongue: English
Weight: 727 KB
Volume: 54
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.101458

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