Redistribution of arsenic during the reaction of nickel thin films with silicon at relatively high temperature: Role of agglomeration

✍ Scribed by K. Hoummada; D. Mangelinck; C. Perrin; P. Gas; V. Carron; P. Holliger; E. Ziegler

• Book ID: 108207669
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 675 KB
• Volume: 83
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2006.10.016