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Formation of Amorphous Silicon by the Low-Temperature Tunneling Reaction of H Atoms with Solid Thin Film of SiH 4 at 10 K

✍ Scribed by Hiraoka, Kenzo; Sato, Tetsuya; Sato, Shoji; Hishiki, Shigeomi; Suzuki, Katsunori; Takahashi, Yukinori; Yokoyama, Tatsuya; Kitagawa, Shinichi

Book ID: 127319336
Publisher: American Chemical Society
Year: 2001
Tongue: English
Weight: 85 KB
Volume: 105
Category: Article
ISSN: 0022-3654
DOI: 10.1021/jp010553b

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