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<p><P>Will nanoelectronic devices continue to scale according to Mooreβs law? At this moment, there is no easy answer since gate scaling is rapidly emerging as a serious roadblock for the evolution of CMOS technology. Channel engineering based on high-mobility semiconductor materials (e.g. strained
<p><em>Polycrystalline Silicon for Integrated Circuits and Displays, Second</em><em>Edition</em> presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of