Study of spiral inductors using Cu/low-k
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Yo-Sheng Lin; Hum-Ming Hsu
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Article
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2002
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John Wiley and Sons
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English
β 212 KB
## Abstract Spiral inductors with various turn numbers fabricated with the use of leadingβedge 0.13βΞΌm mixedβsignal/RF CMOS technology with 193βnm lithography and Cu/lowβk interconnect are described in this article. It is shown that quality (Q) factor decreased and increased with increasing tempera