Real-time X-ray reflectometry during thin-film processing
β Scribed by Peverini, L. ;Kozhevnikov, I. ;Ziegler, E.
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 464 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
An apparatus and a characterization technique have been developed at the ESRF beamline BM5 to investigate inβsitu the evolution of the morphology of a film using grazing incidence Xβray reflectometry. The instrument is capable of measuring inβsitu and in real time the Xβray intensity specularly and diffusely scattered from a rough thin film during various surfacing processes. The variation of the specular intensity as a function of the processing time, recorded simultaneously with each Xβray scattering diagram, is analyzed to infer the film growth rate, the film density and the variation of roughness conformity during surface processing.
The potential of the method is demonstrated for two particular cases: thin film deposition by magnetron sputtering and subsequent film etching by low energy ion bombardment. The paper describes some recent achievements and present examples of onβline diagnostics for which real time inβsitu Xβrays reflectometry proves to be a unique probe. (Β© 2007 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
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