Atomic Layer Deposition of Titanium Oxid
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K. Kukli; M. Ritala; M. Schuisky; M. Leskelä; T. Sajavaara; J. Keinonen; T. Uust
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Article
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2000
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John Wiley and Sons
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English
⚖ 534 KB
TiO 2 thin films have been grown on amorphous soda lime glass and polycrystalline silicon substrates from TiI 4 and H 2 O 2 by atomic layer deposition (ALD) in the temperature range 250±490 C. The film growth rate and refractive index increased linearly with growth temperature up to 300 C. Between 3