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Real time monitoring and control of wet etching of GaAs/Al[sub 0.3]Ga[sub 0.7]As using real time spectroscopic ellipsometry

✍ Scribed by Cho, Sang-Jun; Snyder, P. G.

Book ID: 121696499
Publisher: AVS (American Vacuum Society)
Year: 1999
Tongue: English
Weight: 501 KB
Volume: 17
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.590869

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