Multichannel process monitor for real-ti
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F Heinrich; D Heinze; T Kowalski; P Hoffmann; P Kopperschmidt
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Article
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1998
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Elsevier Science
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English
โ 498 KB
The versatile multichannel process monitor system, MPM-X, designed for the online control of plasma and ion beam etching and deposition is introduced. It provides a number of in situ process data like etch rate and selectivity, deposition rate, film thickness, uniformity and endpoint. This is achiev