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Real-time, in situ infrared study of etching of Si(100) and (111) surfaces in dilute hydrofluoric acid solution

✍ Scribed by Niwano, Michio; Miura, Taka-aki; Kimura, Yasuo; Tajima, Ryo; Miyamoto, Nobuo

Book ID: 121194309
Publisher: American Institute of Physics
Year: 1996
Tongue: English
Weight: 407 KB
Volume: 79
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.361203

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