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Real time controlled rf reactor for deposition of a-Si:H thin films

✍ Scribed by JL Andújar; E Bertran; A Canillas; J Esteve; J Andreau; JL Morenza

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
235 KB
Volume
39
Category
Article
ISSN
0042-207X

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✍ C. Gasqueres; F. Maury; F. Ossola 📂 Article 📅 2003 🏛 John Wiley and Sons 🌐 English ⚖ 273 KB 👁 1 views

## Abstract In‐situ temperature measurement is essential in CVD in order to control the temperature of the growing films. This is frequently achieved by optical pyrometry because it is a sensitive, convenient, and inexpensive technique that can be used in corrosive atmospheres. In this work, in‐sit