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Deposition of boron doped a-Si:H films by a novel combination of rf glow discharge technique and filament heating: Enhancement of doping efficiency

✍ Scribed by Debabrata Das; S.N. Sharma; T.K. Bhattacharyya; S. Chattopadhyay; A.K. Barua; Ratnabali Banerjee


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
594 KB
Volume
97
Category
Article
ISSN
0038-1098

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