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Reactivity of CCl4 plasma against SiO2 surfaces

✍ Scribed by Dr. H.-J. Tiller; R. Göbel; F.-W. Breitbarth

Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
569 KB
Volume
18
Category
Article
ISSN
0232-1300

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✍ H.-J. Tiller; G. Rudakoff 📂 Article 📅 1979 🏛 Elsevier Science 🌐 English ⚖ 408 KB

During p&ma tratment of SiOl (deh)dm:ed at 700°C in high \*actturn) electrons become trapped at the surface and in the bulk. The captured electrons from the ~4 known Ei centre, an F-like electron centre with the unpaired electron &nIy in an s-t) oe orbit& and COT which comes irom carbon impurities.