Reactively magnetron sputtered TiAlz.sbnd;N thin films with enhanced mechanical properties

Relationship between Condition of Deposi

Relationship between Condition of Deposition and Properties of W-Ti-N Thin Films Prepared by Reactive Magnetron Sputtering

✍ A. V. Kuchuk; V. P. Kladko; O. S. Lytvyn; A. Piotrowska; R. A. Minikayev; R. Rat 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 313 KB 👁 2 views

A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p