Reactive sputtered Ta2O5 antireflection coatings
β Scribed by F. Rubio; J. Dennis; J.M. Albella; J.M. Martinez-Duart
- Publisher
- Elsevier Science
- Year
- 1983
- Weight
- 299 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0379-6787
No coin nor oath required. For personal study only.
β¦ Synopsis
Ta2Os antireflection coatings were prepared by reactive sputtering from a tantalum target in a magnetron system. The optical constants of the films were determined from reflectance and transmittance spectra in the 0.25-2.5 #m wavelength interval. The refractive index was close to 2.0 in the visible region, resulting in optimum impedance matching for silicon solar cells. The sputtered Ta2Os films showed an absorption coefficient smaller than about 103 cm -1 for photon energies below 4 eV. Finally, sputtered Ta2Os antireflection coatings were tested on silicon solar cells and were found to increase the efficiency of the cells from 9.5% to 12.9%.
π SIMILAR VOLUMES
## Abstract The optical properties of rf sputtered (30; 52 nm) Ta~2~O~5~ before and after O~2~ annealing at 1173 K have been investigated in the terms of storage capacitor applications for high density dynamic memories. Refractive index and thickness of the films are determined from transmittance a