Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry

✍ Scribed by R. Krishnan; Tom Mathews; A.K. Balamurugan; S. Dash; A.K. Tyagi; Baldev Raj; Vikram Jayaram

• Book ID: 108064212
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 395 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2009.11.076