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Reactive Ion Etching of RuO2 Films: The Role of Additive Gases in O2 Discharge

✍ Scribed by Pan, Wei ;Desu, S. B.

Publisher: John Wiley and Sons
Year: 1997
Tongue: English
Weight: 298 KB
Volume: 161
Category: Article
ISSN: 0031-8965
DOI: 10.1002/1521-396x(199705)161:1<201::aid-pssa201>3.0.co;2-u

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