Reactive ion etching of keep trenches in silicon with CF2 Cl2 and O2 : G. Wohl, M. Matthes and A. Weisheit. Vacuum 38(11), 1011 (1988)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 125 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90137-c