Reactive ion beam etching of tantalum silicide for VLSI applications: A. Baudrant, A. Passerat and D. Bollinger Solid St. Technol. 183 (September 1983)

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 92 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(85)80159-2