Reactions of SiH2(X̄1A1) with H2, CH4, C2H4, SiH4 and Si2H6 at 298 K
✍ Scribed by Gen Inoue; M. Suzuki
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 313 KB
- Volume
- 122
- Category
- Article
- ISSN
- 0009-2614
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✦ Synopsis
Reaction rate constartls of SiHI(%'At) have been directly measured for the first time using the laser photolysis-laser-induced fluorescence method. The preparation of SiH: radical in the laser photolysis (193 m-n) or phenylsilane and the concentration of the radiczd is demonstrated by a dye laser at 580.1 nm (%('AI-A'B,). The rerrction raw constants or SiH2(X'A,) with Hz. CH,. C,H,. SiH, and SilHL_ are 0.001. 0.01. 0.97_ 1.1 and 5.7 xIO-'~ cm3 molecule-' s-l_ respectively. For BH,(A'B,(O.Z.O)).
the collision-free liretime is 0.6 ps and the quenching rate cot-&ant for He is 3.8X iO-" cm' mole.cule-' s-'.
📜 SIMILAR VOLUMES
The excess molar volumes V E m of binary mixtures of {x(C4H9)2O + (1-x)H(CH2)n (OCH2CH2)3OH} for n=1, 2, and 4 have been measured as a function of mole fraction x using a continuous-dilution dilatometer at T=298.15 K. The V E m decreases in magnitude as the alkyl chain length of the alkoxyethanol in